Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-02-23
1989-06-27
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
204298, C23C 1434
Patent
active
048427039
ABSTRACT:
A magnetron sputter coating assembly. The assembly includes a concave consumable target spaced closely to a substrate coating position. Coating uniformity is maintained by controlling ion formation between the substrate and the target. This is accomplished with a plurality of ferromagnetic pole pieces and two individually energizable current carrying coils. The consumable target may be constructed in two segments. A first inner segment defines a generally planar target base parallel to the substrate surface to be coated. A second, outer target segment has a coating surface that forms an angle with respect to the substrate surface.
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Class Walter H.
Smith James F.
Eaton Corporation
Weisstuch Aaron
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