Magnetron atomization source and method of use thereof

Details Magnetron atomization source and method of use thereof Magnetron atomization source and method of use thereof

1995-04-07

1997-11-18

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429811, 20429818, C23C 1434

Patent

active

056883811

ABSTRACT:
For optimizing the yield of atomized-off material on a magnetron atomization source, a process space, on the source side, is predominantly walled by the atomization surface of the target body. The magnetron atomization source has a target body with a mirror-symmetrical, concavely constructed atomization surface with respect to at least one plane and a magnetic circuit arrangement operable to generate a magnetic field over the atomization surface. The magnetic circuit arrangement includes an anode arrangement, a receiving frame which extends around an edge of the target body and is electrically insulated with respect thereto. The receiving frame has a receiving opening for at least one workpiece to be coated. The magnetron source can be used to provide storage disks, such as CDs, with an atomization coating.

REFERENCES:
patent: 5080772 (1992-01-01), Hurwitt et al.
patent: 5112467 (1992-05-01), Zejda
patent: 5164063 (1992-11-01), Braeuer et al.
patent: 5174875 (1992-12-01), Hurwitt et al.
patent: 5330632 (1994-07-01), Sichmann
patent: 5334302 (1994-08-01), Kubo et al.

Affiliated with

Also associated with

Rating

Magnetron atomization source and method of use thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetron atomization source and method of use thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetron atomization source and method of use thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1562833