Magnetoresistive random access memory, and manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S421000, C365S157000, C365S171000, C365S173000

Reexamination Certificate

active

07095069

ABSTRACT:
The present invention discloses a magnetoresistive random access memory (MRAM) and a manufacturing method thereof. The whole cells are connected to each other by using a substrate as a ground terminal and a vertical structure field effect transistor (FET) for connecting the cells to the bit line. Thus, the MRAM is easily manufactured without requiring a special process for isolation of each cell. The MRAM uses the vertical structure FET to simplify the whole manufacturing process. An MTJ cell mask process which is essential in a general horizontal structure FET is omitted, to improve a speed of the MRAM and attain high integration of the MRAM.

REFERENCES:
patent: 5940319 (1999-08-01), Durlam et al.
patent: 6175515 (2001-01-01), Peczalski et al.
patent: 2002/0140016 (2002-10-01), Cha
patent: 2003/0067800 (2003-04-01), Koganei
patent: 5226635 (1993-09-01), None
patent: 2002-0076460 (2002-10-01), None

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