Magnetoresistive head, method of fabricating the same and magnet

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

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20419215, 427131, 427132, 427124, 427125, 427250, C23C 1434

Patent

active

060745355

ABSTRACT:
The present invention relates to a method of fabricating a magnetoresistive head formed by laminating a magnetic layer and a nonmagnetic metal layer including a silver film and used for converting change in magnetic field into change of resistivity of the device. A method of fabricating a magnetoresistive head upon laminating on a substrate a plurality of magnetic layers arranged to put nonmagnetic metal layer therebetween and a bias magnetic layer formed adjacent to one of the magnetic layers to give a magnetization of the specified direction to the magnetic layer, comprising the steps of setting film thicknesses of the nonmagnetic metal layers to be formed, and forming the nonmagnetic metal layers under a condition where temperature of the substrate is held within a temperature range less than an upper limit of a film forming temperature not to cause pin holes in the nonmagnetic metal layer.

REFERENCES:
patent: 5159513 (1992-10-01), Dieny et al.
patent: 5206590 (1993-04-01), Dieny et al.
patent: 5304975 (1994-04-01), Saito et al.
patent: 5447781 (1995-09-01), Kano et al.
patent: 5493465 (1996-02-01), Kamiguchi et al.
Japan 6-60336 Abstract Mar. 1994.

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