Static information storage and retrieval – Systems using particular element – Magnetoresistive
Reexamination Certificate
2008-04-08
2008-04-08
Nguyen, Viet Q. (Department: 2827)
Static information storage and retrieval
Systems using particular element
Magnetoresistive
C365S055000, C365S066000, C365S130000, C365S171000, C365S173000, C365S225500
Reexamination Certificate
active
07355883
ABSTRACT:
A magnetoresistance effect element includes a first ferromagnetic layer (1), insulating layer (3) overlying the first ferromagnetic layer, and second ferromagnetic layer (2) overlying the insulating layer. The insulating layer has formed a through hole (A) having an opening width not larger than 20 nm, and the first and second ferromagnetic layers are connected to each other via the through hole.
REFERENCES:
patent: 5936402 (1999-08-01), Schep et al.
patent: 6469926 (2002-10-01), Chen
patent: 6473275 (2002-10-01), Gill
patent: 6538921 (2003-03-01), Daughton et al.
patent: 6937447 (2005-08-01), Okuno et al.
patent: 7116575 (2006-10-01), Katti
patent: 2001/0009063 (2001-07-01), Saito et al.
patent: 2002/0051380 (2002-05-01), Kamiguchi et al.
patent: 2002/0054461 (2002-05-01), Fujiwara et al.
patent: 2002/0135935 (2002-09-01), Covington
patent: 2000-293982 (2000-10-01), None
patent: 2001-143227 (2001-05-01), None
patent: WO 97-47982 (1997-12-01), None
N. Garcia, et al., “Magnetoresistance in Excess of 200% in Ballistic Ni Nanocontacts at Room Temperature and 100 Oe,” Physical Review Letters, vol. 82, No. 14, Apr. 5, 1999, pp. 2923-2926.
J.J. Versluijs, et al., “Magnetoresistance of Half-Metallic Oxide Nanocontacts,” Physical Review Letters, vol. 87, No. 2, Jul. 9, 2001, pp. 026601-1 through 026601-4.
Haneda Shigeru
Kamiguchi Yuzo
Kishi Tatsuya
Ohsawa Yuichi
Okuno Shiho
Kabushiki Kaisha Toshiba
Nguyen Viet Q.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
LandOfFree
Magnetoresistance effect element, its manufacturing method,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Magnetoresistance effect element, its manufacturing method,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetoresistance effect element, its manufacturing method,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2761126