Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-10-07
1998-09-22
Zimmerman, John J.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
427128, 369 13, 369272, 369283, 428694RE, 428694MM, C23C 1434, G11B 584, G11B 566, B05D 100
Patent
active
058109790
ABSTRACT:
A method of producing a magneto-optical recording medium provided with a reproducing layer on a recording film on a substrate, the reproducing film being in-plane magnetized at room temperature and perpendicularly magnetized at an elevated temperature, and the recording film being perpendicularly magnetized at temperatures between room temperature and its Curie temperature. The method includes the steps of forming the reproducing layer on the substrate while applying a magnetic field in a direction parallel to the film surface of the reproducing film which is being formed, and forming the recording film on the reproducing film.
REFERENCES:
patent: 5428585 (1995-06-01), Hirokane et al.
patent: 5452272 (1995-09-01), Murakami et al.
patent: 5547773 (1996-08-01), Miyakoshi et al.
patent: 5563852 (1996-10-01), Murakami et al.
Patent Abstracts of Japan, vol. 17, No. 438, p. 1591 (Aug. 12, 1993) (Abstract in English of JP 05-089536).
Fujii Eiichi
Nishimura Naoki
Canon Kabushiki Kaisha
LaVilla Michael
Zimmerman John J.
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