Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-05-18
1998-04-14
Kiliman, Leszek
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, 2041922, 20419222, 427127, 427128, 428694ML, 428694SC, 428294DE, 428294MT, 428694NF, 428694RL, 428900, C23C 1400
Patent
active
057387656
ABSTRACT:
A magneto-optic memory device includes a transparent dielectric film of a non-oxygen containing nitride material deposited by sputtering on a substrate such as glass, a rare-earth/transition metal alloy recording medium deposited by sputtering on the dielectric film and a reflecting film deposited over the recording medium with or without an intervening transparent dielectric film of non-oxygen containing nitride material. This arrangement prevents the recording medium from being oxidized, and stablizes coercive force characteristics and information recording characteristics of the recording medium.
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Hirokane Junji
Katayama Hiroyuki
Ohta Kenji
Takahashi Akira
Yamaoka Hideyoshi
Kiliman Leszek
Sharp Kabushiki Kaisha
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