Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1993-03-22
1994-05-31
Kwon, John T.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511131, 31511171, 31511181, 118723VE, 20429841, H01J 724
Patent
active
053172353
ABSTRACT:
A cathodic arc metal deposition apparatus that prevents the deposition of metal droplets with the metal ions being deposited. The cathode has an annular configuration. An annular solenoidal magnet is positioned adjacent to the cathode with their central openings in alignment. The opening diameters and spacings of the cathode and magnet is such that no line of sight exists between the cathode and a target to be coated. Preferably, the arc is initiated between the cathode and an annular anode located around the cathode, separated from the cathode by an insulating layer. The arc is initiated by a high voltage pulse formed between a trigger electrode ring within the cathode opening and the cathode. In an alternative embodiment, a plurality of individual cathodes are positioned in a circle in place of the single ring electrode. The anode may surround the set of cathodes, or may be a screen between the cathodes and the magnet. A multi-screen extractor is preferably provided to direct ions toward the target.
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ISM Technolog
Kwon John T.
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