Magnetically enhanced RIE process and apparatus

Details Magnetically enhanced RIE process and apparatus Magnetically enhanced RIE process and apparatus

1988-05-27

1991-01-08

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156657, 1566591, 156662, 156345, 20419237, 204298, 20429837, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

049832530

ABSTRACT:
An etching process and apparatus employ a novel magnetic enhancement means and a substantially pure molecular bromine plasma in order to perform in a desired manner for a number of important applications requiring etching of single-crystal and polycrystalline silicon.

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D. L. Flamm, P. L. Cowan, and J. A. Golovchenko, "Etching and Film Formation in CF3Br Plasmas; Some Qualitative Observations and Their General Implications", J. of Vacuum Science Tech., 1341-1347.
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