Magnetically enhanced microwave plasma generating apparatus

Details Magnetically enhanced microwave plasma generating apparatus Magnetically enhanced microwave plasma generating apparatus

1998-02-27

2000-04-25

Nguyen, Nam

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723MR, C23F 102, C23C 1600

Patent

active

060540168

ABSTRACT:
There is provided a plasma generating apparatus comprising: a waveguide for guiding a microwave; a vacuum vessel connected to the waveguide, having a means for supplying a gas for discharging electrons and a means for evacuating; and a dielectric member in a tube-like shape or a rod-like shape which is inserted in the vacuum vessel, wherein the dielectric member is provided with a means for emitting the microwave, whereby it is possible to apply the electric power of microwave effectively to plasma of high density exceeding so-called cut-off density and to homogenize the distribution of plasma in the vacuum vessel.

REFERENCES:
patent: 4265730 (1981-05-01), Hirose et al.
patent: 4831963 (1989-05-01), Saito et al.
patent: 4893584 (1990-01-01), Doehler et al.
patent: 4960073 (1990-10-01), Suzuki et al.
patent: 5022961 (1991-06-01), Izumi et al.
patent: 5266146 (1993-11-01), Ohno et al.
patent: 5306985 (1994-04-01), Berry
patent: 5387288 (1995-02-01), Shates
patent: 5429070 (1995-07-01), Campbell et al.
patent: 5749966 (1998-05-01), Shates
M. Nagatsu et al., "Optical Emission and Microwave Field Intensity Measurements in Surface Wave-Excited Planar Plasma", Jpn. J. Appl. Phys. vol. 35, Part 2, No. 3A, Mar. 1996, pp. L341-L344.

Affiliated with

Also associated with

Rating

Magnetically enhanced microwave plasma generating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetically enhanced microwave plasma generating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetically enhanced microwave plasma generating apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-990628