Magnetically enhanced, inductively coupled plasma source for...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...

Reexamination Certificate

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Details

C250S42300F, C250S424000, C250S492210, C315S111810, C356S316000

Reexamination Certificate

active

10988745

ABSTRACT:
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.

REFERENCES:
patent: 7176469 (2007-02-01), Leung et al.

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