Magnetically enhanced capacitive plasma source for ionized...

Details Magnetically enhanced capacitive plasma source for ionized... Magnetically enhanced capacitive plasma source for ionized...

2006-08-01

2006-08-01

Ho, Tan (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111710, C204S192120, C313S231310

Reexamination Certificate

active

07084573

ABSTRACT:
A capacitive plasma source for iPVD is immersed in a strong local magnetic field, and may be a drop-in replacement for an inductively coupled plasma (ICP) source for iPVD. The source includes an annular electrode having a magnet pack behind it that includes a surface magnet generally parallel to the electrode surface with a magnetic field extending radially over the electrode surface. Side magnets, such as inner and outer annular ring magnets, have polar axes that intersect the electrode with poles closest to the electrode of the same polarity as the adjacent pole of the surface magnet. A ferromagnetic back plate or back magnet interconnects the back poles of the side magnets. A ferromagnetic shield behind the magnet pack confines the field away from the iPVD material source.

REFERENCES:
patent: 5274306 (1993-12-01), Kaufman et al.
patent: 5326981 (1994-07-01), Hara et al.
patent: 5717294 (1998-02-01), Sakai et al.
patent: 5828176 (1998-10-01), Goebel
patent: 5972185 (1999-10-01), Hendricks et al.
patent: 6254745 (2001-07-01), Vukovic
patent: 6896775 (2005-05-01), Chistyakov
patent: 2004/0094402 (2004-05-01), Gopalraja et al.
Plasma Physics, Chapter VIII. Processing Plasmas, pp. 5-6, www.physics.usyd.edu.au/˜mmmb/plasma/chapter8.pdf , Last updated on Feb. 2003.

Affiliated with

Also associated with

Rating

Magnetically enhanced capacitive plasma source for ionized... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetically enhanced capacitive plasma source for ionized..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetically enhanced capacitive plasma source for ionized... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3710654