Magnetically confined plasma reactor for processing a semiconduc

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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118723E, 118723I, 20429837, H05H 100

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active

060304863

ABSTRACT:
The invention confines the plasma within the chamber without relying entirely on the chamber walls by introducing a magnetic field across an area or plane through which plasma flow is to be stopped. For example, in order to prevent plasma from leaking or flowing through openings necessarily provided the chamber walls, a magnetic field is established at the entrance of the reactor chamber to such an opening, by placing a pair of opposing magnetic poles across the opening, for example. The magnetic field is sufficiently strong to prevent plasma leaking through the opening.

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