Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-10-19
1994-02-15
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429819, C23C 1435
Patent
active
052863611
ABSTRACT:
An improved method and assembly for attaching sputtering targets to cathode assemblies of sputtering systems which includes a magnetically permeable material. The magnetically permeable material is imbedded in a target base that is brazed, welded, or soldered to the sputter target, or is mechanically retained in the target material. Target attachment to the cathode is achieved by virtue of the permanent magnets and/or the pole pieces in the cathode assembly that create magnetic flux lines adjacent to the backing plate, which strongly attract the magnetically permeable material in the target assembly.
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Makowiecki Daniel M.
McKernan Mark A.
Halverson Danny C.
Regents of the University of California
Sartorio Henry P.
Weisstuch Aaron
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