Magnetic semiconductor material and method for preparation...

Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Ii-vi compound

Reexamination Certificate

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C438S003000, C438S095000

Reexamination Certificate

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07102171

ABSTRACT:
A magnetic semiconductor material having magnetization characteristics and a method for preparing the same is provided.In the method for preparing the magnetic semiconductor, Mn is vapor-deposited at a thickness of 200 to 300 Å onto a CdGeP2single crystal (2) while the CdGeP2single crystal (2) is maintained at a temperature of about 390° C. in a molecular beam epitaxy apparatus (1). The Mn-deposited CdGeP2single crystal is heated at a temperature of about 510° C. for 1 hour. Thus, a magnetic semiconductor comprising CdMnGeP2and having magnetization characteristics at room temperature is prepared.

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patent: 2002/0130311 (2002-09-01), Lieber et al.
patent: 6-45248 (1994-02-01), None
Medvedkin et al., “Room Temperature Ferromagnetism in Novel Diluted Magnetic Semiconductor CdMnGeP2”, Oct. 2000, Jpn. J. Appl. Phys., vol. 39, pp. L949-L951.

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