Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-02-01
2005-02-01
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192200, C427S129000, C427S130000, C427S131000, C427S132000
Reexamination Certificate
active
06849164
ABSTRACT:
A magnetic recording medium and method of manufacturing the same including directly texturing a surface of a non-magnetic substrate made of a glass material to form circular concentric grooves thereon, forming a seed layer on the non-magnetic substrate, forming an under layer on the seed layer, forming a magnetic layer on the under layer, and forming a protective layer on the magnetic layer. A ratio of an in-plane remanent magnetization in a circumferential direction of the magnetic recording medium to an in-plane remanent magnetization in a radial direction of the magnetic recording medium is equal to or greater than 1.05.
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English Machine Translation of 2001-009694.
Ando Yuji
Ataka Toyoji
Masuda Katsuya
Nakamura Satoru
Shimosato Manabu
Fuji Electric & Co., Ltd.
McDonald Rodney G.
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