Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-11-17
1998-03-03
Kiliman, Leszek
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
427128, 427129, 427130, 427131, C23C 1434
Patent
active
057230323
ABSTRACT:
A magnetic recording medium capable of making a high-density recording, with improved magnetic characteristics such as coercive force (Hc) and other factors, in which the flatness of the surface of a magnetic recording medium is maintained, and a method for the manufacture thereof are disclosed. By disposing a non-magnetic metal buffer layer 6 between a non-magnetic glass substrate 1 and a non-magnetic metal under layer 2 and keeping a ratio d.sub.1 /d.sub.2 of the half bandwidth of an X-ray diffraction peak of the metal buffer layer 6 and the metal under layer 2 predetermined values, a large increase in coercive force (Hc) can be obtained. In addition, by controlling the film thickness .delta. of the metal buffer layer 6 and the base substance temperature (T) when the metal buffer layer 6 is formed, magnetic characteristics such as squareness (S), coercive force squareness (S.sup.*), coercive force difference (.DELTA. HC) and coercive force squareness difference (.DELTA. S.sup.*) can be improved.
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Mamiya Yukiko
Ueda Atsushi
Uwazumi Hiroyuki
Yamaguchi Kiyoto
Fuji Electric & Co., Ltd.
Kiliman Leszek
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