Magnetic orienting device for thin film deposition and method of

Details Magnetic orienting device for thin film deposition and method of Magnetic orienting device for thin film deposition and method of

1995-01-06

1997-05-20

Breneman, R. Bruce

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20429816, C23C 1434

Patent

active

056309163

ABSTRACT:
A sputtering apparatus for depositing a thin film (66) of magnetic material on a substrate (26) is modified to include a plate-shaped electromagnet (34, 44, or 70) for orienting magnetic domains within the film (66). The electromagnet (34, 44, or 70) has conductive windings (38; 46, 48, and 50; or 72) that are arranged for producing a magnetic field (42 or 52) within a plane (60) corresponding to a surface of the substrate (26). Field strength vectors (68) vary in absolute magnitude between points located along a first axis (62), but have substantially uniform components of magnitude at the same points measured in a common direction along the first axis (62).

REFERENCES:
patent: 3336154 (1967-08-01), Oberg et al.
patent: 4094764 (1978-06-01), Boucher et al.
patent: 4155825 (1979-05-01), Fournier
patent: 4247383 (1981-01-01), Greve et al.
patent: 4581118 (1986-04-01), Class et al.
patent: 4595482 (1986-06-01), Mintz
patent: 4673482 (1987-06-01), Setoyama et al.
patent: 4810346 (1989-03-01), Wolf et al.
patent: 4853102 (1989-08-01), Tateishi et al.
patent: 4865709 (1989-09-01), Nakagawa
patent: 4871433 (1989-10-01), Wagner et al.
patent: 5006219 (1991-04-01), Latz et al.
patent: 5026470 (1991-06-01), Bonyhard et al.
patent: 5045166 (1991-09-01), Bobbio
patent: 5061838 (1991-10-01), Lane et al.
Paper entitled "Manufacturing Techniques", pp. 1-28.
"Ferromagnetic Properties of Films" by Mitchell S. Cohen, M.I.T. Lincoln Laboratory, Lexington, Mass., Ch. 17, pp. 17-1 thru 17-43.
"Relation of thickness and some physical properties of NiFe thin films" by R.M. Valletta, G. Guthmiller, and G. Gorman, J. Vac. Sci. Technol. A9(4) Jul./Aug. 1991, American Vacuum Society, pp. 2093-2098.

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