Magnetic mirror plasma source

Details Magnetic mirror plasma source Magnetic mirror plasma source

2005-06-28

2005-06-28

Vo, Tuyet Thi (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111710, C204S192120, C204S192100, C118S7230AN, C118S7230FI

Reexamination Certificate

active

06911779

ABSTRACT:
The preferred embodiments described herein provide a magnetic mirror plasma source. While the traditional magnetic/electrostatic confinement method is ideal for many applications, some processes are not best served with this arrangement. The preferred embodiments described herein present a new technique to confine electrons (3) to produce a low pressure, dense plasma directly on a substrate surface (75). With these preferred embodiments, a combination of electrostatic and mirror magnetic confinement is implemented. The result is a novel plasma source that has unique and important advantages enabling advancements in PECVD, etching, and plasma treatment processes.

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