Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1987-08-18
1988-05-10
Pianalto, Bernard D.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
428457, 428694, 428900, C23C 1400
Patent
active
047433485
ABSTRACT:
A magnetic medium for horizontal magnetization recording which comprises a non-magnetic substrate and a magnetic recording film formed on at least one side of the substrate, is described. The magnetic recording film consists essentially of an amorphous Co-Cr alloy containing from 5 to 15 atomic percent of oxygen atom. A method for making the above type of medium is also described in which the magnetic film is vapor deposited under conditions of a partial pressure of oxygen gas of 1.times.10.sup.-3 to 3.times.10.sup.-3 Torr., and a sputtering rate of from 0.05 to 0.15 .mu.m/minute.
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Sugita et al, "CoCr Perpendicular Recording Medium by Vacuum Deposition", IEEE Journal, Nov. 1981, pp. 3172-3174.
Ando Toshio
Kimura Akihiro
Nishihara Toshikazu
Pianalto Bernard D.
Victor Company of Japan Ltd.
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