Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2005-07-05
2005-07-05
Norton, Nadine G. (Department: 1765)
Etching a substrate: processes
Forming or treating article containing magnetically...
C216S052000, C216S067000, C216S072000, C216S074000, C216S075000
Reexamination Certificate
active
06913704
ABSTRACT:
A magnetic head including a dual layer induction coil. Following the deposition of a first magnetic pole (P1) a first induction coil is fabricated. Following a chemical mechanical polishing (CMP) step a layer of etchable insulation material is deposited followed by the fabrication of a second induction coil etching mask. A reactive ion etch process is then conducted to etch the second induction coil trenches into the second etchable insulation material layer. The etching depth is controlled by the width of the trenches in an aspect ratio dependent etching process step. The second induction coil is next fabricated into the second induction coil trenches, preferably utilizing electrodeposition techniques. Thereafter, an insulation layer is deposited upon the second induction coil, followed by the fabrication of a second magnetic pole (P2) upon the insulation layer.
REFERENCES:
patent: 4318148 (1982-03-01), Kaminaka et al.
patent: 4416056 (1983-11-01), Takahashi
patent: 5113300 (1992-05-01), Ikeda et al.
patent: 5643824 (1997-07-01), Chien et al.
patent: 5734534 (1998-03-01), Yamamoto et al.
patent: 5814547 (1998-09-01), Chang et al.
patent: 5827437 (1998-10-01), Yang et al.
patent: 5872693 (1999-02-01), Yoda et al.
patent: 6178070 (2001-01-01), Hong et al.
patent: 6191916 (2001-02-01), Sasaki
patent: 6191918 (2001-02-01), Clarke et al.
patent: 6204997 (2001-03-01), Sasaki
patent: 6246541 (2001-06-01), Furuichi et al.
patent: 6304414 (2001-10-01), Crue et al.
patent: 6320726 (2001-11-01), Sasaki
patent: 6350556 (2002-02-01), Asanuma
patent: 05267251 (1993-10-01), None
patent: 10-83520 (1998-03-01), None
Hsiao Richard
Hsiao Yiping
Guillot Robert O.
Hitachi Global Storage Technologies - Netherlands B.V.
Intellectual Property Law Offices
Norton Nadine G.
Tran Binh X.
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