Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2006-02-28
2006-02-28
Duda, Kathleen (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C430S324000
Reexamination Certificate
active
07005242
ABSTRACT:
A read sensor and method of making the same using an etch-stop layer are disclosed. The method is particularly suitable in connection with techniques requiring the partial removal of the capping layer, such as exchange tab (ET) and lead overlay (LOL) techniques. Basically, a thin “etch-stop” layer is deposited over a top free layer of sensor materials. The etch-stop layer is made of a suitable material such as copper-oxide (CuO) or nickel-iron-chromium (NiFeCr). A tantalum (Ta) capping layer is then deposited over the etch-stop layer. When appropriate, top edge portions of the capping layer are exposed to a reactive ion etch (RIE) using a fluorine gas for removal. Advantageously, the etch-stop layer significantly reduces or eliminates damage to the free layer that would otherwise occur due to the fluorine gas RIE.
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Duda Kathleen
International Business Machines - Corporation
Zilka-Kotab, PC
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