Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1997-12-02
1999-01-12
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427249, 4272552, 427294, 427547, 427571, 427577, 427585, 427586, 427596, 427598, H05H 102
Patent
active
058584781
ABSTRACT:
The present invention relies upon a free space magnetic field in a pulsed laser deposition (PLD) chamber for forming high quality thin films made from diverted ions from a plume evaporated from an ablated target illuminated by a pulsed laser beam. The magnetic field exerts a qv.times.B Lorentz force upon the ions that is orthogonal to the magnetic field and to their direction of travel in the plume, and curves the ions toward the substrate, while neutral particulates continue to pass by the substrate so that the large neutral particulates are not deposited on the substrate. A shield prevents the deposition of plume species in direct line of sight between the target and the substrate so that only charged ions curved by the magnet are deposited on the substrate. A permanent magnet is used to separate charged species from neutral species. The magnetic field deflects the charged species away from the primary direction of travel of the plume and toward the substrate for deposition of the charged ion species on the substrate. The method provides particulate-free films having improved crystallinity, uniformity and adhesion.
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Pianalto Bernard
Reid Derrick Michael
The Aerospace Corporation
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