Magnetic etching process, especially for magnetic or...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S296000, C430S320000, C250S492300, C250S492200

Reexamination Certificate

active

07132222

ABSTRACT:
Process for writing on a material, in which said material is irradiated by means of a beam of light ions, such as for example He+ions, said beam of light ions having an energy of the order of or less than a hundred keV, wherein this material comprises a plurality of superposed thin-layers, at least one of said thin layers being magnetic and in that one or more regions having sizes of the order of 1 micrometer or less are irradiated, the irradiation dose being controlled so as to be a few 1016ions/cm2or less, the irradiation modifying the composition of atomic planes in the material at one or more interfaces between two layers of the latter.

REFERENCES:
patent: 4551908 (1985-11-01), Nagasawa et al.
patent: 4600488 (1986-07-01), Imura et al.
patent: 6331364 (2001-12-01), Baglin et al.
patent: 6383598 (2002-05-01), Fullerton et al.
patent: 6605321 (2003-08-01), Ravelosona-Ramasitera et al.
patent: 2773632 (1999-07-01), None
patent: 62-297458 (1987-12-01), None
patent: 0129688 (1989-11-01), None
patent: 99/35657 (1999-07-01), None
Terris, B.D., et al., “Ion Beam paterning og magnetic films using stancil masks”, Appl. Phys. Lett., vol. 75(3). pp. 403-405. (Jul. 1999).
Weller et al., Ino Induced Magnetization reorientation in Co/Pt multilayers for paterned media, J. Appl. Phys., vol. 87(9)pp. 5768-5770 (May 2000).
Le Boite′ M.G., et al., Study of ion beam mixed multilayers via neutron scattering., Mater. Lett., vol. 6(5,6) pp. 173-176 (Mar. 1988).
Le Boite′ M. G., et al., Characterization of in beam mixed multilayers via grazing x ray reflectometry, J. Mater. Res. vol. 3(6) pp. 1089-1096 (Nov./Dec. 1988).
Traverse, A., et al., Quantitative Description of Mixing with light ions., Europhys. Lett., vol. 8(7) pp. 633-637 (Apr. 1989).
Kanayama et al., “Fine Pattern Definition with Atomic Intermixing Induced by Focused Ion Beam and Its Application to X-ray Mask Fabrication”, J. Vac Sci. Technol. B, vol. 9(2) pp. 296-301 (Apr. 1991).
Jung et al. “Atomic Transport by Ion Beam Mixing in the Radiation Enhanced Diffusion Region”, Mat. Res. Soc. Symp. Proc. vol. 354 pp. 21-26 (1995).
Steckl et al. “Review of Focused ion beam mixing for the fabrication of GaAs based optoelectronic devices”, J. Vac. Sci. Technol. B, vol. 13(6) pp. 2570-2575 (Nov./Dec. 1995).
Gamo et al., “Recent advances in the Application of focussed ion beams”, Mat. Res. Sco. Symp. Proc., vol. 45 pp. 223-234 (1985).
Specification denoted WO 99/35657 in upper left and 1 in upper right.
Specification denoted 2 in upper right hand corner.
Ziao J Q. et al.: “Effects of ar-Ion implantation and annealing on structural and magnetic properties of CO/PD multilayers” Journal of applied Physics, vol. 76, No. 10, part 02 Nov. 15, 1994, pp. 6081-6083.
Amaral L. et al.: “Very Thin Fe/Ni modulation multilayer films under ion bombardment” Journal of Applied Physical vol. 81, No. 8, part 02B, Apr. 15, 1997, pp. 4773-4775.
Gladyszewski G. et al.: “Modification of Structure, Electric and Magnetic Properties of Epitaxially Grown Ag(001)/FE(001) Superlattices” Journal of Magnetism and Magnetic Materials, vol. 156, No. 1/03, Apr. 1, 1996, p. 381-382.
Choe G. et al.: “Effect of Ion Beam Mixing on Microstructure and Magnetic Properties of GD-Co Multilayer Films” Journal of Applied Physics, vol. 79, No. 8, part 02B, Apr. 16, 1996.
Schelp L. F. et al.: “Structural and Magnetic Behavior of AR+-Implanted Co/PD Multilayers: Interfacial Mixing” Journal of Applied Physics vol. 75, No. 10, part 01, May 15, 1994.

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