Etching a substrate: processes – Forming or treating article containing magnetically...
Patent
1996-07-10
1999-03-09
Powell, William
Etching a substrate: processes
Forming or treating article containing magnetically...
156345, 216 67, B44C 122
Patent
active
058795693
ABSTRACT:
To provide a magnetic disk excellent in floating and sliding characteristics in a low floating area. A magnetic disk having a feature that variations in the height of the projections on each surface of protective films in floating ensured areas on both sides of the magnetic disk are .+-.15%, and a magnetic disk device on which the magnetic disk is mounted. A surface processing apparatus for a magnetic disk, including: a first electrode for fixing the magnetic disk, the first electrode having an inside diameter larger than the inside diameter of the non-magnetic substrate; an electrically grounded shield for shielding the first electrode; a second electrode, disposed in parallel to the surface of the magnetic disk, for generating plasma against the surface of the magnetic disk; and a plasma control member, disposed at a position separated from the outer edge of the magnetic disk by a specified distance, for controlling plasma generated against the surface of the magnetic disk; wherein a power is applied between the first and second electrodes for plasma-etching the surface of the magnetic disk.
REFERENCES:
patent: 5411630 (1995-05-01), Nagase et al.
patent: 5549211 (1996-08-01), Nakamura et al.
Inomata Yoichi
Matsumoto Hiroshi
Shige Noriyuki
Takagaki Tokuho
Tsutsumi Kazuhiko
Hitachi , Ltd.
Powell William
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