Magnet assembly for plasma containment

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S7230ER, C118S7230AN, C156S916000

Reexamination Certificate

active

10726008

ABSTRACT:
A magnet assembly for a plasma process chamber has a hollow collar comprising a cross-section that is absent seams. The hollow collar has an open end face and a cap is provided to seal the open end face of the collar. A plurality of magnets are in the hollow collar, the magnets being insertable through the open end face. The collar is capable of being snap fitted onto the chamber wall. The magnet assembly can also comprise one or more of the collars such that the collars, when installed, form a substantially continuous ring about a chamber wall.

REFERENCES:
patent: 4842683 (1989-06-01), Cheng et al.
patent: 5215619 (1993-06-01), Cheng et al.
patent: 6074512 (2000-06-01), Collins et al.
patent: 6228235 (2001-05-01), Tepman et al.
patent: 6232236 (2001-05-01), Shan et al.
patent: 6451177 (2002-09-01), Gopalraja et al.
patent: 6488807 (2002-12-01), Collins et al.
patent: 2003/0192646 (2003-10-01), Wu et al.
patent: WO 191164 AS (2001-12-01), None
patent: 2000268995 (2000-09-01), None
“end.” Merriam-Webster Online Dictionary. 2006-2007. http://www.m-w.com/dictionary/end (Feb. 3, 2007).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Magnet assembly for plasma containment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnet assembly for plasma containment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnet assembly for plasma containment will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3873651

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.