Low work function, stable compound clusters and generation proce

Details Low work function, stable compound clusters and generation proce Low work function, stable compound clusters and generation proce

1998-05-18

2000-02-01

Ramsey, Kenneth J.

Compositions

Electrically conductive or emissive compositions

Carbide containing

2525181, 2525213, 445 51, H01J 902

Patent

active

06019913&

ABSTRACT:
Low work function, stable compound clusters are generated by co-evaporation of a solid semiconductor (i.e., Si) and alkali metal (i.e., Cs) elements in an oxygen environment. The compound clusters are easily patterned during deposition on substrate surfaces using a conventional photo-resist technique. The cluster size distribution is narrow, with a peak range of angstroms to nanometers depending on the oxygen pressure and the Si source temperature. Tests have shown that compound clusters when deposited on a carbon substrate contain the desired low work function property and are stable up to 600.degree. C. Using the patterned cluster containing plate as a cathode baseplate and a faceplate covered with phosphor as an anode, one can apply a positive bias to the faceplate to easily extract electrons and obtain illumination.

REFERENCES:
patent: 4568853 (1986-02-01), Boutot
patent: 5666025 (1997-09-01), Geis et al.

Affiliated with

Also associated with

Rating

Low work function, stable compound clusters and generation proce does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low work function, stable compound clusters and generation proce, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low work function, stable compound clusters and generation proce will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-934898