Low voltage transistor structure having a grooved gate

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257396, 257401, 257407, 257622, 438259, H01L 2976

Patent

active

060911069

ABSTRACT:
Disclosed is a transistor structure having a semiconductor substrate with a active region and a field region, a recess region being defined by either the field region or the active region, a gate electrode formed on portions of the active and recess region, and impurity regions formed in the active region of the semiconductor substrate on either side of the gate electrode. The transistor structure has an active region with at least one groove formed therein, and the transistor structure being formed for a low voltage operation.

REFERENCES:
patent: 5208173 (1993-05-01), Yamada et al.
patent: 5285096 (1994-02-01), Ando et al.
patent: 5831323 (1998-11-01), Motonami et al.
patent: 5905283 (1999-05-01), Kasai

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Low voltage transistor structure having a grooved gate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low voltage transistor structure having a grooved gate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low voltage transistor structure having a grooved gate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2039307

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.