Low-voltage source for narrow electron/ion beams

Details Low-voltage source for narrow electron/ion beams Low-voltage source for narrow electron/ion beams

1989-10-27

1990-09-04

Berman, Jack I.

Radiant energy

Ion generation

Field ionization type

250423F, 250310, 313336, 3133601, 3133631, 313230, 31511181, H01J 37073, H01J 3708

Patent

active

049547119

ABSTRACT:
This source for charged particles comprises a sharply pointed tip (1) and an aperture (2) in a thin sheet of material. If the point of the tip (1) is made sharp enough, i.e., if it ends in a single atom or a trimer of atoms, the electric field existing between the tip (1) and the aperture (2) will cause a stream of electrons to be emitted from the tip (1), pass the aperture (2) and to continue as a beam (4) of free electrons beyond said aperture (2). The sheet (3) carrying the aperture (2) may, for example, be a carbon foil or a metallic foil, including gold. The distance of the tip (1) from the aperture (2) is in the submicron range, and so is the diameter of said aperture (2). The distance is being held essentially constant by means of a feedback loop system. The divergence of the beam (4) is <2.degree.. If the source is operated in an ultra-high vacuum, the particle beam ( 4) will consist of free electrons, whereas, if the source is operated in a noble-gas atmosphere, the beam (4) will consist of noble-gas ions. Both, the electron beam, as well as the ion beam, contains particles of a very low frequency.

REFERENCES:
patent: 3814975 (1974-06-01), Wolfe et al.
patent: 3959651 (1976-05-01), Welter
patent: 4020387 (1977-04-01), Coates et al.
patent: 4427886 (1984-01-01), Martin et al.
patent: 4591754 (1986-05-01), Hagiwara et al.
patent: 4721878 (1988-01-01), Hagiwara et al.
patent: 4740705 (1988-04-01), Crewe
"Point Source for Ions and Electrons", Physica Scripta, vol. 38, (1988), pp. 260-263, H-W. Fink.

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