Low voltage electron beam system

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

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Details

250307, 250397, H01J 37256, H01J 3728

Patent

active

057897484

ABSTRACT:
An electron beam system provides low aberration, 10 nm resolution at 100 eV provides efficient detection of secondary electrons from the sample. The 10 keV to less than 100 eV, reduces distortions due to sample surface topography, and serves to accelerate secondary electrons back toward the detector, further improving detection efficiency.

REFERENCES:
patent: 4896036 (1990-01-01), Rose et al.
patent: 4987311 (1991-01-01), Devore
Hordon, L. et al., Improved retarding field optics via image outside field, J. Vac. Sci. Tech. B., 13(3), pp. 826-832, May/Jun. 1995.

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