Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2001-06-29
2004-06-29
Tran, Minhloan (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S311000, C365S145000
Reexamination Certificate
active
06756620
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates generally to microelectronic device fabrication. More particularly, the present invention relates to fabrication of a microelectronic storage device. In particular, the present invention relates to a cross-point ferroelectric polymer memory device.
2. Description of Related Art
In the microelectronics field, continual pressure exists to find faster, denser, and more cost-effective solutions to data storage. Whether the data storage is fast, on-die storage such as static random access memory (SRAM), whether it is the somewhat slower embedded dynamic random access memory (eDRAM), the even slower off-die dynamic random access memory (DRAM), or whether it is magnetic- or magneto optical disks for mass storage, each technology is constantly being advanced to meet the demand for increased speed and capacity.
It was discovered that some polymers exhibit ferromagnetism. One such polymer is poly vinylidene fluoride (PVDF, whose repeat formula is (CH
2
—CF
2
)
n
) and some of its copolymers. Another continual pressure that exists is lower energy requirements for nonvolatile data storage, particularly for mobile platform data storage that may use storage media such as flash memory or disk drives.
What is needed in the art is a non-volatile, low-power data storage solution.
REFERENCES:
patent: 3623038 (1971-11-01), Franklin et al.
patent: 4538884 (1985-09-01), Masaki
patent: 4593456 (1986-06-01), Cheung
patent: 4873455 (1989-10-01), De Chambost et al.
patent: 4995705 (1991-02-01), Yoshinaga et al.
patent: 5248564 (1993-09-01), Ramesh
patent: 5438023 (1995-08-01), Argos et al.
patent: 5499206 (1996-03-01), Muto
patent: 5519566 (1996-05-01), Perino et al.
patent: 5578867 (1996-11-01), Argos et al.
patent: 5592643 (1997-01-01), Thomas
patent: 5777356 (1998-07-01), Dhote et al.
patent: 5838035 (1998-11-01), Ramesh
patent: 5843808 (1998-12-01), Karnezos
patent: 5864932 (1999-02-01), Evans et al.
patent: 5890016 (1999-03-01), Tso
patent: 5927206 (1999-07-01), Bacon et al.
patent: 5939775 (1999-08-01), Bucci et al.
patent: 6034882 (2000-03-01), Johnson et al.
patent: 6054331 (2000-04-01), Woo et al.
patent: 6055180 (2000-04-01), Gudesen et al.
patent: 6072716 (2000-06-01), Jacobson et al.
patent: 6072718 (2000-06-01), Abraham et al.
patent: 6115281 (2000-09-01), Aggarwal et al.
patent: 6141309 (2000-10-01), Saitou et al.
patent: 6171934 (2001-01-01), Joshi et al.
patent: 6194229 (2001-02-01), Basceri
patent: 6210979 (2001-04-01), Kweon et al.
patent: 6265230 (2001-07-01), Aggarwal et al.
patent: 6269018 (2001-07-01), Monsma et al.
patent: 6314641 (2001-11-01), Akram
patent: 6323512 (2001-11-01), Noh et al.
patent: 6324069 (2001-11-01), Weber
patent: 6337032 (2002-01-01), Chivukula et al.
patent: 6376259 (2002-04-01), Chu et al.
patent: 6420190 (2002-07-01), Shimoda et al.
patent: 2001/0050869 (2001-12-01), Nishikawa et al.
patent: 2002/0000005 (2002-01-01), Jermier
patent: 2002/0024835 (2002-02-01), Thomson et al.
patent: 2002/0044480 (2002-04-01), Gudesen et al.
patent: 2002/0093845 (2002-07-01), Matsuoka et al.
patent: 1 152 463 (2001-11-01), None
patent: 363 293 729 (1988-11-01), None
patent: WO 99/12170 (1999-03-01), None
patent: WO 00/42652 (2000-07-01), None
patent: WO 02/43071 (2002-05-01), None
Borca, C., et al., “Influence of dynamical scattering in crystalline poly(vinylidene fluoride-trifluoroethylene) copolymers”,Applied Physics Letters, vol. 74,347-349, (Jan. 18, 1999).
Borca, C., et al., “Lattice-Stiffening Transition in Copolymer Films of Vinylidene Fluoride (70%) with Trifluoroethylene (30%)”,Physical Review Letters,4562-4565, (Nov. 29, 1999).
Bune, A., et al., “Piezoelectric and pyroelectric properties of ferroelectric Langmuir-Blodgett polymer films”,Journal of Applied Physics, vol. 85,7869-7873, (Jun. 1, 1999).
Bune, A., et al., “Two-dimensional ferroelectric films”,Nature, vol. 391,874-877, (Feb. 26, 1998).
Choi, J., et al., “Phase transition in the surface structure in copolymer films of vinylidene fluoride (70%) with trifluoroethylene (30%)”,Physical Review B, vol. 61,5760-5770, (Feb. 15, 2000).
Desu, S., “Minimization of Fatigue in Ferroelectric Films”,Phys. Stat. Sol. (a) 151,467-480, (1995).
Ducharme, S., et al., “Ultrathin Ferroelectric Polymer Films”,Ferroelectrics, vol. 202,29-37, (1997).
Lovinger, A.J., “Ferroelectric Polymers”,Science, vol. 220,1115-1121, (Jun. 10, 1983).
Morikawa, E., et al., “Photoemission study of direct photomicromachining in poly(vinylidene fluoride)”,Journal of Applied Physics, vol. 87,4010-4016, (Apr. 15, 2000).
IBM Technical Disclosure Bulletin, vol. 37 (11), pp. 421-424, 1994.
Bune et al., “Two-Dimensional Ferroelectric Films”, Nature, Feb. 26, 1998, MacMillian Magazines, UK, vol. 391, No. 6670 pp. 874-877.
Bune et al., “Novel Switching Phenomena in Ferroelectric Langmuir-Blodgett Films”, Applied Physics Letters, Dec. 25, 1995, AIP USA, vol. 67, No. 26, pp. 3975-3977.
Isenberger Mark
Li Jian
Mu Xiao-Chun
Dickey Thomas L
Martinez Anthony M.
Tran Minhloan
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