Coating apparatus – Gas or vapor deposition
Patent
1996-03-28
1997-08-05
Bueker, Richard
Coating apparatus
Gas or vapor deposition
20429807, 137606, C23C 1600
Patent
active
056538073
ABSTRACT:
An epitaxial film deposition system has a low vacuum venturi pump for initially partially purging the system of toxic gases, and a high vacuum turbo-molecular pump to further sharply reduce the pressure to maximize toxic gas purging along with the detection of any slight leaks of toxic gases in the system. A source gas mixing manifold has an array of gas feed lines layed out in a rectangular array for forwarding the gases to the reactor furnace, wherein each feed line has an equal path length between each run valve of the mixing manifold and the reactor to minimize switching transient variations.
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Bueker Richard
Lund Jeffrie R.
Nathans Robert L.
The United States of America as represented by the Secretary of
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