Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2008-01-01
2008-01-01
Toledo, Fernando L. (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S118000, C257S466000
Reexamination Certificate
active
07314832
ABSTRACT:
A method of forming a film on a substrate. In accordance with the invention, an adhesion layer is formed on the substrate. The adhesion layer is chemically bonded to the substrate and has a textured surface. The film is then formed on the textured surface of the adhesion layer.
REFERENCES:
patent: 6472014 (2002-10-01), Matsuba
Adamson Michael
Kountz Michael
Olsen Randy
Dowell & Dowell , P.C.
Pan Jit Americas, Inc.
Tobergte Nicholas J.
Toledo Fernando L.
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