Low temperature plasma enhanced CVD process within tubular membe

Details Low temperature plasma enhanced CVD process within tubular membe Low temperature plasma enhanced CVD process within tubular membe

1991-10-18

1993-06-29

Lusigan, Michael

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427573, 427570, 427569, 427237, 427238, 427105, 118723, 118729, B05D 306, B05D 722

Patent

active

052233081

ABSTRACT:
A method for the low temperature, microwave enhanced, chemical vacuum deposition of thin film material onto a surface of a hollow member by creating a sub-atmospheric pressure condition adjacent the surface to be coated while maintaining the applicator through which microwave energy is introduced at substantially atmospheric pressure.

REFERENCES:
patent: 4349582 (1982-09-01), Beerwald et al.
patent: 4417911 (1983-11-01), Cundy et al.
patent: 4692347 (1987-09-01), Yasuda
patent: 4897284 (1990-01-01), Arai et al.
patent: 4897285 (1990-01-01), Wilhelm
patent: 4965090 (1990-10-01), Gartner et al.

Affiliated with

Also associated with

Rating

Low temperature plasma enhanced CVD process within tubular membe does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low temperature plasma enhanced CVD process within tubular membe, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low temperature plasma enhanced CVD process within tubular membe will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1753993