Low temperature, high pressure silicon deposition method

Details Low temperature, high pressure silicon deposition method Low temperature, high pressure silicon deposition method

1996-12-10

1999-02-23

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

427255, 4272551, 4272552, 427314, 438482, 438488, 148DIG1, 148DIG122, C23C 1600

Patent

active

058741291

ABSTRACT:
A method of producing amorphous silicon layers on a substrate by chemical vapor deposition at elevated pressures of at least about 25 Torr whereby deposition occurs at practicable rates. A substrate is loaded in a vacuum chamber, the temperature adjusted to obtain an amorphous silicon deposit of predetermined microcrystalline density, and the silicon precursor gases fed to the chamber to a preselected high pressure. Doped amorphous silicon films also can be deposited at high deposition rates.
The above amorphous silicon films have a low density of nucleation sites; thus when the films are annealed, polycrystalline films having large crystal grains are produced.

REFERENCES:
patent: 3900597 (1975-08-01), Chruma et al.
patent: 4217374 (1980-08-01), Ovshinsky et al.
patent: 4237150 (1980-12-01), Wiesmann
patent: 4379020 (1983-04-01), Glaeser et al.
patent: 4404236 (1983-09-01), Komatsu et al.
patent: 4444812 (1984-04-01), Gutsche
patent: 4592933 (1986-06-01), Meyerson et al.
patent: 4634605 (1987-01-01), Wiesmann
patent: 4745088 (1988-05-01), Inoue et al.
patent: 4963506 (1990-10-01), Liaw et al.
patent: 5037666 (1991-08-01), Mori
J. Bloem, "High Chemical Vapor Deposition Rates of Epitaxial Silicon Layers": J. Cryst. Growth, 18 (1973) pp. 70-76, North Holland Publishing Co.
W.A.P. Claasen et al, "The Deposition of Silicon from Silane in a Low-Pressure Hot-Wall System", J. Cryst. Growth 57 (1982) pp. 259-266, North Holland Publishing Co.
Morosanu, C.E., Thin Films by Chemical Vapor Deposition, Elsevier, p. 107, 1990.
Schuegraf, K.K. Handbook of Thin Film Deposition Processes and Techniques Noyes Publications 1988 pp. 80-81.
Kern, W. et al. "Advances in Deposition Processes for Passivation Films" J. Vac. Sci. Technol. vol. 14, No. 5 Sep./Oct. 1977, pp. 1082-1099.
Schuegraf, K.K. Handbook of Thin Film Deposition Processes and Techniques Noyes Publications 1988 p. 93.
Schuegraf, K.K., Handbook of Thin Film Deposition Processed and Techniques Noyes Publications, 1988 p. 86.
Morosanu, C.E. Thin Films by Chemical Vapor Deposition Elsevier 1990 p. 48.
Bunshah et al, "Deposition Technologies for Films and Coatings" Noyes Publications 1982, p. 357.
Foster, et al., "Silicon Films Deposited in a Verticle Flow Reactor", Solid State Technology, May 1980.

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