Low temperature control of rapid thermal processes

Details Low temperature control of rapid thermal processes Low temperature control of rapid thermal processes

1999-04-22

2000-10-10

Paik, Sang

Electric heating

Heating devices

With power supply and voltage or current regulation or...

392416, 374121, 2503381, H05B 102, A21B 200, G01J 500

Patent

active

061304158

ABSTRACT:
An apparatus for processing a semiconductor substrate mounted in a thermal processing chamber includes a heating system for heating the substrate, which includes lamps facing a front side of the substrate and a power supply system providing power to at least one of the lamps with a DC power component and an AC power component at a selected frequency. The AC power component is a selected fraction of the DC power component. The apparatus also has a sensor facing a back side of the substrate for providing a detected signal indicative of measured radiation from the back side of the substrate. A lock-in system provides a lock-in signal indicative of a magnitude of an AC component of the detected signal at the selected frequency in response to the detected signal and a reference signal at the selected frequency. A processing system is adapted to determine a transmitted portion of the measured radiation that is transmitted through the substrate based upon the lock-in signal, the detected signal and the selected fraction.

REFERENCES:
patent: 5061084 (1991-10-01), Thompson et al.
patent: 5170041 (1992-12-01), Amith et al.
patent: 5180226 (1993-01-01), Moslehi
patent: 5641419 (1997-06-01), Vandenabeele
patent: 5997175 (1999-12-01), Champetier et al.

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