Low stress pellicle frames and reticle pellicle assemblies

Details Low stress pellicle frames and reticle pellicle assemblies Low stress pellicle frames and reticle pellicle assemblies

2008-03-31

2010-12-14

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07851109

ABSTRACT:
Low stress reticle pellicle assemblies. In accordance with certain embodiments of the present invention, a pellicle frame of reduced stiffness is employed to reduce the stress a pellicle frame induces in a reticle plate. In other embodiments, a pellicle frame of reduced adhesive surface is employed to reduce the stress a pellicle frame induces in a reticle plate. In accordance with still other embodiments, a stress compensating frame is employed to reduce the cumulative stresses in an assembly comprising the reticle plate, pellicle and stress compensating frame.

REFERENCES:
patent: 6359718 (2002-03-01), Lin et al.
patent: 6797439 (2004-09-01), Alpay
patent: 7298458 (2007-11-01), Berman et al.
patent: 2004/0194556 (2004-10-01), Shu et al.
patent: 2006/0146313 (2006-07-01), Gallagher et al.
patent: 2007/0264582 (2007-11-01), Chang et al.

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