Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Reexamination Certificate
2007-06-21
2009-12-29
Chen, Bret (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
Mixture of vapors or gases utilized
C427S255391, C427S255394, C117S088000, C117S089000
Reexamination Certificate
active
07638170
ABSTRACT:
Thermal atomic layer deposition processes are provided for growing low resistivity metal carbonitride thin films. Certain embodiments include methods for forming tantalum carbonitride (TaCN) thin films. In preferred embodiments, TaCN thin films with a resistivity of less than about 1000 μΩ·cm are grown from tantalum halide precursors and precursors that contribute both carbon and nitrogen to the growing film. Such precursors include, for example, hexamethyldisilazane (HMDS), tetramethyldisilazane (TMDS), bisdiethylaminosilane (BDEAS) and hexakis(ethylamino)disilane (HEADS).
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ASM International N.V.
Chen Bret
Knobbe Martens Olson & Bear LLP
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