Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate
2005-02-22
2005-02-22
Smoot, Stephen W. (Department: 2813)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
C438S652000, C438S674000, C438S686000, C438S687000
Reexamination Certificate
active
06858479
ABSTRACT:
A method for forming a low resistively copper conductor line includes forming a silver material layer on silicon material, and forming a copper material layer on the silver material layer using an electroplating process.
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patent: 5788854 (1998-08-01), Desaigoudar et al.
patent: 6197688 (2001-03-01), Simpson
patent: 6221765 (2001-04-01), Ueno
patent: 6291082 (2001-09-01), Lopatin
patent: 6605534 (2003-08-01), Chung et al.
Kim Jae-Jeong
Kim Soo-Kil
Kim Yong-Shik
LG.Philips LCD Co. , Ltd.
Morgan & Lewis & Bockius, LLP
Smoot Stephen W.
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