Low refractive index polymers as underlayers for...

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

Reexamination Certificate

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C525S161000, C525S259000, C525S260000, C525S261000, C525S312000, C525S328800, C430S271100, C430S272100, C522S031000, C522S032000, C522S049000, C522S050000, C522S057000, C438S952000, C526S245000, C526S284000, C526S251000

Reexamination Certificate

active

07439302

ABSTRACT:
A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubstituted naphthalene or naphthol moiety, including mixtures thereof. Examples of the polymer of this invention include:where each R1is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. The organic moiety mentioned above may be a substituted or unsubstituted hydrocarbon selected from the group consisting of a linear or branched alkyl, halogenated linear or branched alkyl, aryl, halogenated aryl, cyclic alkyl, and halogenated cyclic alkyl, and any combination thereof. The compositions are suitable for use as a planarizing underlayer in a multilayer lithographic process, including a trilayer lithographic process.

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