Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-03-14
1999-05-11
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118733, C23C16/00
Patent
active
059024062
ABSTRACT:
A low pressure CVD system comprising an inner tube having an upper end and a lower end opened, and made of a silicon carbide material, an outer tube including a circumferential wall surrounding an outer periphery of the inner tube with a predetermined spacing, an upper wall closing an upper end of the circumferential wall and a flange provided at a lower portion thereof, the outer tube having a lower end opened, a base portion for supporting the inner tube and the outer tube at the lower ends thereof, and for providing hermetic sealing between the lower end of the outer tube and the base portion, the base portion having a central portion formed with an opening, a lid provided for opening and shutting the opening in the base portion, and a furnace wall surrounding the circumferential wall and the upper wall of the outer tube, the furnace wall having a heater arranged on an inner side thereof wherein the outer tube is made of a silicon carbide material, and padding of a silicon carbide material is formed at a corner of a joined portion between the circumferential wall and the flange of the outer tube.
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Nishihama Jiro
Tsukamoto Takashi
Uchiyama Taroh
Yoshikawa Yukio
Alejandro Luz
Asahi Glass Company Ltd.
Breneman R. Bruce
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