Low magnification gas limiting aperture assembly for electron mi

Details Low magnification gas limiting aperture assembly for electron mi Low magnification gas limiting aperture assembly for electron mi

1994-06-23

1996-01-16

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

250307, H01J 3704, H01J 37244

Patent

active

054850088

ABSTRACT:
The present invention pertains to scanning electron microscope devices with an improved design that allows for lower magnification capabilities without signal degradation. In particular, the design improvement is in the aperture carrier for the electron detector/differential pumping system therein. Advantages of this improvement include shorter working distances of a specimen under examination to obtain the same magnification for prior art type ESEM apparatus, lower magnification capabilities of an ESEM apparatus, better signal
oise ratio of the specimen and higher chamber pressures in which the specimen can be examined. Other features of the invention herein includes use of a variable displacement mount for holding the sample using a piston design which allows for variable detector positioning with respect to the specimen.

REFERENCES:
patent: 4785182 (1988-11-01), Mancuso et al.
patent: 4823006 (1989-04-01), Danilatos et al.
patent: 5198675 (1993-03-01), Hikita et al.
patent: 5250808 (1993-10-01), Dantilos et al.

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