Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1992-10-26
1994-04-05
Ngo, Ngan
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257301, 257305, H01L 2968, H01L 2978, H01L 2992
Patent
active
053008006
ABSTRACT:
Disclosed is a Dynamic Random Access Memory (DRAM) cell which includes a storage capacitor disposed in a trench formed in a semiconductor substrate and an access transistor disposed in a well which is opposite in conductivity type to that of the substrate and a buried oxide collar which surrounds an upper portion of the trench.
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patent: 4967248 (1990-10-01), Shimizu
Davari, B., et al., "A Variable-Size Shallow Trench Isolation (STI) Technology with Diffused Sidewall Doping for Submicron CMOS", IEDM Tehcnical Digest, 92 (1988).
Bronner, G. B., et al., "Epitaxy Over Trench Technology for ULSI DRAMs", 1988 Symposium on VLSI Technology, p. 21 (May 10-13, 1988).
Cottrell, P., et al., "N-Well Design for Trench DRAM Arrays", IEDM Technical Digest, 584 (1988).
Nobel, W. P., et al., "Parasitic Leakage in DRAM Trench Storage Capacitor Vertical Gated Diodes", IEDM Technical Digest, 340 (1987).
Lu, N., et al., "The SPT Cell-A New Substrate-Plate Trench Cell for DRAMs", IEDM Technical Digest, 771 (1985).
Bronner Gary B.
Dhong Sang H.
Hwang Wei
International Business Machines - Corporation
Meyer Stephen D.
Ngo Ngan
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