Low dielectric constant film material, film and...

Active solid-state devices (e.g. – transistors – solid-state diode – With means to control surface effects – Insulating coating

Reexamination Certificate

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C257S759000, C257S762000

Reexamination Certificate

active

11205128

ABSTRACT:
A low dielectric film forming material contains siloxane resin and polycarbosilane dissolved in solvent. By using this solution, a low dielectric film is formed which contains siloxane resin and polycarbosilane bonded to the siloxane resin. Material of a low dielectric film is provided which is suitable for inter-level insulating film material. A semiconductor device is also provided which has a low dielectric constant film and high reliability.

REFERENCES:
patent: 4745169 (1988-05-01), Sugiyama et al.
patent: 5264319 (1993-11-01), Sugiyama et al.
patent: 5602060 (1997-02-01), Kobayashi et al.
patent: 6043147 (2000-03-01), Chen et al.
patent: 6127258 (2000-10-01), Watanabe et al.
patent: 6232235 (2001-05-01), Cave et al.
patent: 6395649 (2002-05-01), Wu
patent: 6566264 (2003-05-01), Cave et al.
patent: 6677679 (2004-01-01), You et al.
patent: 6734562 (2004-05-01), Farrar
patent: 60-080844 (1985-05-01), None
patent: 5-70119 (1993-03-01), None
patent: 5-105759 (1993-04-01), None
patent: 5-105766 (1993-04-01), None
patent: 5-117392 (1993-05-01), None
patent: 9-199595 (1997-07-01), None
patent: 11-233500 (1999-08-01), None
Korean Office Action dated Jun. 29, 2006, issued in corresponding Korean Patent Application No. 10-2001-0012331.

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