Load lock chamber for large area substrate processing system

Details Load lock chamber for large area substrate processing system Load lock chamber for large area substrate processing system

2008-08-27

2011-12-06

Rodriguez, Saul (Department: 3652)

Material or article handling

Apparatus for moving material between zones having different...

Reexamination Certificate

active

08070408

ABSTRACT:
The present invention generally includes a load lock chamber for transferring large area substrates into a vacuum processing chamber. The load lock chamber may have one or more separate, environmentally isolated environments. Each processing environment may have a plurality exhaust ports for drawing a vacuum. The exhaust ports may be located at the corners of the processing environment. When a substrate is inserted into the load lock chamber from the factory interface, the environment may need to be evacuated. Due to the exhaust ports located at the corners of the environment, any particles or contaminants that may be present may be pulled to the closest corner and out of the load lock chamber without being pulled across the substrate. Thus, substrate contamination may be reduced.

REFERENCES:
patent: 5751003 (1998-05-01), Rose et al.
patent: 5753904 (1998-05-01), Gil et al.
patent: 6059507 (2000-05-01), Adams
patent: 6291800 (2001-09-01), Shirakawa et al.
patent: 6382895 (2002-05-01), Konishi et al.
patent: 6473993 (2002-11-01), Yagi et al.
patent: 7207766 (2007-04-01), Kurita et al.
patent: 7388895 (2008-06-01), Gong et al.
patent: 2003/0150849 (2003-08-01), Beer et al.
patent: 2006/0196422 (2006-09-01), Hiroki
patent: 2007/0006936 (2007-01-01), Hosokawa et al.
patent: 2007/0166133 (2007-07-01), Lee et al.
patent: 2007/0280816 (2007-12-01), Kurita et al.
patent: 10-0561703 (2000-06-01), None
patent: 10-2005-0003272 (2005-01-01), None
International Search Report and Written Opinion for PCT/US2009/055200 (APPM/013572PCT) dated Mar. 24, 2010.

Affiliated with

Also associated with

Rating

Load lock chamber for large area substrate processing system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Load lock chamber for large area substrate processing system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Load lock chamber for large area substrate processing system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4304691