Lithography system and lithography method using the same

Details Lithography system and lithography method using the same Lithography system and lithography method using the same

2007-06-13

2010-06-22

Kim, Robert (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

With target means

C250S3960ML, C250S3960ML, C250S492100, C250S492300

Reexamination Certificate

active

07741614

ABSTRACT:
The window-frame judgment unit judges that a section to be drawn has entered a window-frame area according to the main deflector data and the stage position information to output judgment signal. The main deflector calculator receives the main deflector data and calculates calculation data for driving a driving unit based on the main deflector data. The transfer controller detects output of the judgment signal and completion of drawing in the section under drawing to receive a transfer of the calculation data from the main deflector calculator and transfer the calculation data to the driving unit.

REFERENCES:
patent: 5760410 (1998-06-01), Matsuki et al.
patent: 6646275 (2003-11-01), Oae et al.
patent: 1-152726 (1989-06-01), None
patent: 2000-114137 (2000-04-01), None
patent: 20002252184 (2000-09-01), None

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