Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2007-12-13
2008-12-09
Spector, David N (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
C355S053000, C430S270100
Reexamination Certificate
active
07463423
ABSTRACT:
A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.
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Blahnik Vladan
Kraehmer Daniel
Loering Ulrich
Ulrich Wilhelm
Wabra Norbert
Carl Zeiss SMT AG
Fish & Richardson P.C.
Spector David N
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