Lithography process using one or more anti-reflective coating fi

Details Lithography process using one or more anti-reflective coating fi Lithography process using one or more anti-reflective coating fi

1998-01-08

2000-04-18

Gibson, Sharon

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430313, 430314, 430316, G03F 700

Patent

active

060513691

ABSTRACT:
A lithography process includes a step of forming an antireflective coating film on a substrate. A film is formed on the antireflective film and a radiation sensitive film is formed on the film. The radiation sensitive film is selectively exposed. During the selective exposing, the antireflective film covers the lower surface of the portion of film on which the radiation sensitive film is formed, and the antireflective coating film reduces reflections of radiation during the selective exposing of the radiation sensitive film. A fabrication process using the lithography process is also described.

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