Lithography masks and methods of manufacture thereof

Details Lithography masks and methods of manufacture thereof Lithography masks and methods of manufacture thereof

2011-05-24

2011-05-24

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S005000, C355S053000

Reexamination Certificate

active

07947431

ABSTRACT:
Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate.

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