Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-09-28
2010-12-21
Kik, Phallaka (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C430S005000, C378S035000, C700S120000, C700S121000, C382S154000, C382S144000
Reexamination Certificate
active
07856612
ABSTRACT:
In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.
REFERENCES:
patent: 5124927 (1992-06-01), Hopewell et al.
patent: 5326659 (1994-07-01), Liu et al.
patent: 5527645 (1996-06-01), Pati et al.
patent: 5701365 (1997-12-01), Harrington et al.
patent: 6518180 (2003-02-01), Fukuda
patent: 6611953 (2003-08-01), Filseth et al.
patent: 7063920 (2006-06-01), Baba-Ali
patent: 7266803 (2007-09-01), Chou et al.
patent: 7286284 (2007-10-01), Totzeck et al.
patent: 7328425 (2008-02-01), Olsson et al.
patent: 7546574 (2009-06-01), Torunoglu et al.
patent: 7585596 (2009-09-01), Johnson et al.
patent: 7589819 (2009-09-01), Baba-Ali
patent: 2004/0229130 (2004-11-01), Baba-Ali
patent: 2004/0252870 (2004-12-01), Reeves et al.
patent: 2005/0068509 (2005-03-01), Latypov et al.
patent: 2006/0236295 (2006-10-01), Baba-Ali
patent: 2006/0248495 (2006-11-01), Sezginer
patent: 2007/0031745 (2007-02-01), Ye et al.
patent: 2007/0124708 (2007-05-01), Torres Robles et al.
patent: 2007/0130559 (2007-06-01), Torunoglu et al.
patent: 2007/0198963 (2007-08-01), Granik et al.
patent: 2008/0046846 (2008-02-01), Chew et al.
patent: 2008/0127031 (2008-05-01), Olsson et al.
patent: 2009/0075183 (2009-03-01), Cecil
patent: 2009/0245618 (2009-10-01), Torunoglu et al.
U.S. Appl. No. 11/864,381 Prosecution History, filed Sep. 28, 2007, now issued as U.S. Patent No. 7,716,627, available via USPTO IFW (including office actions, notice of allowance, references cited to date considered by examiner).
Office Action mailed Apr. 7, 2009 of U.S. Appl. No. 11/864,381, filed Sep. 28, 2007, now U.S. Patent No. 7,716,617.
Notice of Allowance mailed Dec. 24, 2009 of U.S. Appl. No. 11/864,381, filed Sep. 28, 2007, now U.S. Patent No. 7,716,617.
Torunoglu Ilhami H.
Ungar P. Jeffrey
Aka Chan LLP
Gauda, Inc.
Kik Phallaka
LandOfFree
Lithography mask design through mask functional optimization... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithography mask design through mask functional optimization..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithography mask design through mask functional optimization... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4228919